Open AccessInfluence of substrate bias voltage on structural and optical properties of RF reactive magnetron sputtered WO3thin films
Author(s) -
V. Madhavi,
Paturu Kondaiah,
S. Uthanna
Publication year - 2012
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/390/1/012059
Subject(s) - materials science , amorphous solid , substrate (aquarium) , thin film , biasing , sputtering , absorption edge , analytical chemistry (journal) , sputter deposition , transmittance , refractive index , optoelectronics , optics , band gap , voltage , chemistry , nanotechnology , crystallography , electrical engineering , oceanography , physics , engineering , chromatography , geology