Open AccessInvestigation of boron implantation into silicon by quantitative energy-filtered transmission electron microscopy
Author(s) -
T. Walther,
Jonathan England
Publication year - 2011
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/326/1/012053
Subject(s) - boron , silicon , transmission electron microscopy , materials science , electron microscope , energy filtered transmission electron microscopy , electron , energy (signal processing) , optoelectronics , scanning transmission electron microscopy , nanotechnology , analytical chemistry (journal) , optics , chemistry , physics , nuclear physics , chromatography , quantum mechanics