Open AccessFlux based modeling and simulation of dry etching for fabrication of silicon deep trench structures
Author(s) -
Rizwan Ahmed Malik,
Tielin Shi,
ZiRong Tang,
Shiyuan Liu
Publication year - 2011
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/276/1/012078
Subject(s) - fabrication , trench , etching (microfabrication) , dry etching , materials science , flux (metallurgy) , silicon , deep reactive ion etching , optoelectronics , nanotechnology , reactive ion etching , metallurgy , medicine , alternative medicine , layer (electronics) , pathology