Open AccessEffect of Ar-gas-pressure on oxygen content of Co–Si–O granular film sputter-deposited by using sintered targets
Author(s) -
Shogo Sasaki,
Shin Saito,
M. Takahashi
Publication year - 2011
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/266/1/012062
Subject(s) - sputtering , gas pressure , materials science , oxygen , oxygen pressure , sputter deposition , content (measure theory) , analytical chemistry (journal) , metallurgy , composite material , chemical engineering , nanotechnology , thin film , chemistry , environmental chemistry , geology , engineering , petroleum engineering , mathematical analysis , mathematics , organic chemistry