Open AccessElectroreflectance spectroscopy study of hydrogen plasma immersion ion implanted silicon with ultrathin oxide film
Author(s) -
S. Alexandrova,
A. Szekeres,
R.Yu. Holiney,
Л. А. Матвеева
Publication year - 2010
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/253/1/012037
Subject(s) - materials science , silicon , oxide , plasma , hydrogen , ion , spectroscopy , silicon oxide , immersion (mathematics) , plasma immersion ion implantation , analytical chemistry (journal) , optoelectronics , ion implantation , chemistry , metallurgy , physics , organic chemistry , chromatography , quantum mechanics , silicon nitride , mathematics , pure mathematics