Open AccessThe dependence of the surface roughness of aluminum nitride films on the processing methods when magnetron sputtering is used
Author(s) -
Л. В. Баранова,
В. И. Струнин,
B. T. Baysova
Publication year - 2022
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2270/1/012005
Subject(s) - materials science , nitride , sputter deposition , surface roughness , surface finish , substrate (aquarium) , aluminium , aluminium nitride , cavity magnetron , physical vapor deposition , crystallite , sputtering , silicon nitride , zirconium nitride , composite material , high power impulse magnetron sputtering , metallurgy , optoelectronics , titanium nitride , thin film , silicon , nanotechnology , coating , layer (electronics) , oceanography , geology