Open AccessH- beam emittance analysis in a multicusp ion source
Author(s) -
Anne George,
Taneli Kalvas,
Stéphane Melanson,
Morgan Dehnel,
Neil G. R. Broderick
Publication year - 2022
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2244/1/012038
Subject(s) - thermal emittance , plasma , atomic physics , ion , beam (structure) , beam emittance , ion beam , ion source , ion beam deposition , debye sheath , electrode , materials science , chemistry , physics , optics , nuclear physics , organic chemistry
Emittance of the ion beam extracted from an ion source is dependent on the initial focusing action at the plasma sheath. The properties of the plasma sheath is further dependent on the local electric fields and charge densities around the sheath. Experiments are conducted for creating different sets of conditions around the plasma sheath in an H - multicusp filament ion source and the resulting emittance of the extracted H - ion beam is measured. Variation of beam emittance under different plasma densities, electrode voltages and gas flows are analysed.