Open AccessFormation and characterization of CuO coatings deposited by reactive magnetron sputtering
Author(s) -
Maria Ormanova,
Georgi Kotlarski,
Stefan Valkov,
Д. Дечев,
N. P. Ivanov,
Petar Petrov
Publication year - 2022
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2240/1/012010
Subject(s) - crystallite , materials science , monoclinic crystal system , sputter deposition , substrate (aquarium) , sputtering , cavity magnetron , diffraction , characterization (materials science) , chemical engineering , phase (matter) , metallurgy , crystallography , crystal structure , microstructure , composite material , thin film , nanotechnology , optics , chemistry , oceanography , physics , engineering , organic chemistry , geology
In this work, CuO coatings were deposited on 304 L stainless steel substrates by reactive magnetron sputtering. During the process, the substrate temperature was varied in the range from 100 °C to 400 °C. The crystallographic structure of the samples thus prepared was characterized by X-ray diffraction, and the results are discussed with respect to the technological conditions applied. It was found that the phase composition of the deposited CuO coatings is in the form of a monoclinic crystal structure. Also, the growth of the coatings was accompanied by a change in the orientation of the crystallites from (022) to (110) and a decrease in the concentration of imperfections.