Open AccessFormation tantalum coating on NiTi surface by magnetron sputtering technique
Author(s) -
A. S. Larionov,
A S Dikov,
Е. А. Жаканбаев
Publication year - 2022
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2155/1/012005
Subject(s) - tantalum , coating , materials science , sputter deposition , nickel titanium , cavity magnetron , metallurgy , layer (electronics) , composite material , sputtering , alloy , thin film , shape memory alloy , nanotechnology
The materials of research the structure and morphology of the tantalum coating on the surface of the NiTi alloy in this work presents. Tantalum was deposited by the DC - magnetron sputtering method. The influence of the energy supplied to the magnetron on the formation of the Ta-coating is shown.Changes in the structure of the coating at different stages of its formation are shown.It was found that with a significant decrease in the energy supplied to the magnetron, tantalum is deposited more uniformly. Besides the gradient of mechanical stresses in the coating is reduced.