Open AccessVisualization of the gas flows that formed above the thin-film coatings under VUV radiation influence
Author(s) -
A. S. Skryabin,
V. D. Telekh,
А. В. Павлов,
D. A. Chesnokov,
V. G. Zhupanov,
П. А. Новиков
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2127/1/012005
Subject(s) - materials science , radiation , optics , optoelectronics , plasma , irradiation , laser , interference (communication) , physics , channel (broadcasting) , electrical engineering , quantum mechanics , nuclear physics , engineering
The plasma focus of a magnetoplasma compressor is a unique source of high-brightness broadband VUV (with photon energy of 5 to 100 electron volt) radiation. When such radiation affects on the surfaces of materials, it is possible to generate rather complex gas-dynamic structures due to the evaporation of the material and ionization of its vapors. A separate task is to study the processes of a gas-dynamic response to the exposure of the specified radiation fluxes on the surface of interference antireflection and reflective multilayers, which are used in modern laser technology, high-power optoelectronics, etc. In this report, we used schlieren photography for studying the features of gas-dynamic structures that arise at irradiation of coatings. Radiation resistant (in the visible and near IR ranges) HfO 2 /SiO 2 and ZrO 2 /SiO 2 multilayer structures (with a total thickness of 140–3700 nanometers and a number of layers of from 2 to 24) were used as prototypes for testing their stability under the VUV exposure.