Open AccessSpecific features of the formation of optical waveguides, contact pads and electrical interconnections on lithium tantalate substrates
Author(s) -
I V Konyaev,
И. И. Бородкин,
Е. Н. Бормонтов
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2103/1/012185
Subject(s) - lithium tantalate , materials science , titanium , sputter deposition , etching (microfabrication) , microstructure , sputtering , photoresist , dry etching , optoelectronics , lithium (medication) , aluminium , composite material , plasma etching , thin film , metallurgy , lithium niobate , nanotechnology , layer (electronics) , medicine , endocrinology
The article considers the formation of titanium channel optical waveguides in LiTaO 3 substrates. These structures were obtained by dry etching of grooves in SF 6 plasma and magnetron sputtering of titanium film. After that, waveguides were formed by plasma etching using photoresist as mask. Technological features and modes of microstructure production are described. Al contact pads were produced by magnetron sputtering thin metal films on LiTaO 3 . Aluminum wires were ultrasonically bonded to Al contact pads using Delvotec 5630. The developed technology of formation of contact pads and bonding modes made it possible to obtain a bonded joint with a bond strength of 23-25 Gs.