Open AccessStudy of Langmuir monolayers and Langmuir-Schaefer films based on symmetrical meso-aryl-substituted porphyrin derivative
Author(s) -
V N Mironyuk,
Ammar J. Al-Alwani,
N. N. Begletsova,
M. V. Gavrikov,
А. С. Колесникова,
M. V. Pozharov,
E. G. Glukhovskoy
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2086/1/012195
Subject(s) - monolayer , surface pressure , langmuir , porphyrin , materials science , monocrystalline silicon , surface roughness , surface finish , aryl , elastic modulus , crystallography , silicon , analytical chemistry (journal) , chemistry , nanotechnology , composite material , photochemistry , organic chemistry , metallurgy , alkyl , physics , aqueous solution , mechanics
This paper presents the results of a study of meso -aryl-substituted porphyrin Langmuir monolayers by the method of compression isotherms. Experimental data were used to plot the dependences of the compression modulus (C −1 ) on the specific area. Monolayers at specific surface pressure were transferred to solid substrates and investigated. The monolayers were transferred to the surface of monocrystalline silicon at surface pressures of 8, 25, and 60 mN/m and examined them by atomic force microscopy (AFM) in a semi-contact mode. It was found that with an increase in the transfer pressure, the coarsening of molecular aggregates occurs. The smallest roughness is observed for a porphyrin film formed and transferred at a pressure of 8 mN/m.