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Influence of dielectric overlayers on self-heating of a microdisk laser
Author(s) -
Sergey Scherbak,
E. I. Moiseev,
I. A. Melnichenko,
Ju A Guseva,
M. V. Maximov,
Alexey Lihachev,
N. V. Kryzhanovskaya,
A. A. Lipovskiĭ,
A. E. Zhukov
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2086/1/012100
Subject(s) - heat sink , materials science , dielectric , photoresist , laser , thermal resistance , heat flux , chemical mechanical planarization , thermal management of electronic devices and systems , layer (electronics) , thermal , dissipation , optoelectronics , convection , composite material , heat transfer , optics , thermodynamics , physics , engineering , mechanical engineering
We studied experimentally and numerically self-heating of a microdisk laser developed in the AlGaInAs material system and covered with dielectric layers. By experiments, we found that planarization of the microlaser with SU-8 photoresist significantly (almost, 2-fold) decreases the microlaser thermal resistance. Calculations demonstrate that a downward heat flux through the substrate to the heat sink is a dominant way of heat dissipation, and upward convection is much less relevant. Also, the calculations showed that covering microlaser with a TiO2 layer barely affects microdisk temperature but decreases heat localization in the structure.

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