
Deposition of aluminium nanoparticles using dense plasma focus device
Author(s) -
Naorem Bilasini Devi,
Savita Roy,
M. P. Srivastava
Publication year - 2010
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/208/1/012103
Subject(s) - aluminium , wafer , materials science , nanoparticle , substrate (aquarium) , anode , nanolithography , dense plasma focus , argon , plasma , deposition (geology) , nanotechnology , plasma cleaning , analytical chemistry (journal) , composite material , chemistry , electrode , chromatography , fabrication , paleontology , physics , sediment , geology , alternative medicine , oceanography , pathology , biology , quantum mechanics , medicine , organic chemistry