Open AccessResearch progress of carbon-assisted etching of silicon nanostructures
Author(s) -
Xiaoyu Yang,
Ling Tong,
Lin Wu,
Baoguo Zhang,
Zhirong Liao,
Ao Chen,
Yufei Zhou,
Ying Li,
Yu Hu
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2076/1/012060
Subject(s) - nanotechnology , materials science , silicon , nanostructure , etching (microfabrication) , commercialization , photovoltaics , carbon fibers , engineering physics , optoelectronics , photovoltaic system , electrical engineering , engineering , layer (electronics) , composite material , composite number , political science , law
Silicon nanostructures are attracting growing attention due to their properties and promising application prospects in solar energy conversion and storage devices, thermoelectric devices, lithium-ion batteries, and biosensing technologies. The large-scale and low-cost preparation of silicon nanostructures is critical for silicon-based advanced functional devices commercialization. In this paper, the feasibility and mechanism of silicon nanostructure fabricated by non-metallic carbon catalytic etching, as well as the currently existing problems and future development trend are reviewed.