Open AccessTwo-stage PVD method for protective coating formation
Author(s) -
В. А. Бурдовицин,
A.V. Tyunkov,
Yu. G. Yushkov,
D.B. Zolotukhin
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2064/1/012074
Subject(s) - materials science , coating , dielectric , substrate (aquarium) , composite material , evaporation , nitride , layer (electronics) , oxide , titanium , dissipation factor , aluminium , cavity magnetron , electron beam physical vapor deposition , titanium oxide , physical vapor deposition , thin film , titanium nitride , optoelectronics , metallurgy , nanotechnology , chemical engineering , sputtering , oceanography , physics , engineering , thermodynamics , geology
The CVD methods are typically used for the formation of aluminum oxide coatings since aluminum oxide is a dielectric. The adhesion between the protective coating and the substrate material is normally improved by growing thin intermediate layers based on titanium oxides and nitrides. These intermediate layers are mainly formed using the PVD methods. In this paper, we propose a two-stage PVD method for forming a layered structure on the titanium substrate. The formation of intermediate layers was carried out by the magnetron method (first stage), and the main protective layer was deposited at the second stage using a fore-vacuum electron source. The dense beam plasma generated during the electron beam transport in a fore-vacuum gas medium compensates for the negative electrical charge accumulating on the surface of the aluminum oxide target and facilitates its effective evaporation. The electrical properties of the intermediate layers and the resulting layered coatings have been investigated, including the tangent of dielectric loss angle, the real and imaginary parts of the conductivity and the dielectric constant dependencies on frequency.