Open AccessEffect of the annealing temperature on the structural properties of hafnium nanofilms by magnetron sputtering
Author(s) -
Thant Sin Win,
A. P. Kuzmenko,
V V Rodionov,
Min Myo Than
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2064/1/012071
Subject(s) - materials science , hafnium , sputter deposition , annealing (glass) , amorphous solid , microstructure , raman spectroscopy , diffractometer , scanning electron microscope , monoclinic crystal system , analytical chemistry (journal) , cavity magnetron , crystallization , chemical engineering , thin film , sputtering , zirconium , composite material , crystal structure , crystallography , metallurgy , nanotechnology , optics , chemistry , physics , engineering , chromatography
In this work investigated the effect of the annealing temperature on hafnium nanofilms obtained by DC magnetron sputtering on Si substrates. The nanofilms annealed through 100°C to 700°C by a High-Temperature Strip Heater Chambers (HTK-16N) on an X-ray Diffractometer (XRD). The microstructure and morphology of the films at different temperatures were investigated by XRD, Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and Raman Microspectrometer (RS). It was found that annealing affects changes in the lattice strains, texture, grain size, and roughness of Hf nanofilms. According to XRD data, the structure of the thin films showed amorphous from room temperature to 100°C and starting from a temperature of 200°C were changed crystallization. At 500°C a monoclinic structure corresponding to hafnium dioxide HfO 2 was formed in hafnium nanofilms.