Open AccessPlasma diagnostics during deposition of Zr-B-N coatings by magnetron sputtering of UHTC ceramic in DCMS and HIPIMS modes
Author(s) -
А. Д. Сытченко,
Ph. V. KiryukhantsevKorneev
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2064/1/012062
Subject(s) - high power impulse magnetron sputtering , materials science , plasma , argon , sputter deposition , ceramic , cavity magnetron , ion , sputtering , nitrogen , deposition (geology) , analytical chemistry (journal) , metallurgy , thin film , nanotechnology , atomic physics , chemistry , environmental chemistry , paleontology , sediment , biology , physics , organic chemistry , quantum mechanics
In this work, plasma diagnostics during the deposition of Zr-B-N coatings by DCMS and HIPIMS methods were carried out, the structural characteristics and growth rates of the obtained coatings were investigated; the regularities of the influence of the working atmosphere on the composition of the plasma, as well as on the thickness and growth rate of the coatings are revealed. It was found that the introduction of nitrogen leads to a decrease in the concentration of Zr and B ions in the plasma, as a result of which the growth rate of the coatings decreases. Note that, when using the DCMS method, predominantly argon plasma is observed, while with HIPIMS, the plasma is characterized by a large number of metal ions.