Open AccessIon current optimization in a magnetron with tunable magnetic field configuration
Author(s) -
Andrey V. Kaziev,
D G Ageychenkov,
Alexander V. Tumarkin,
D. V. Kolodko,
N. S. Sergeev,
M. M. Kharkov,
Kseniia Leonova
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2064/1/012061
Subject(s) - saturation current , ion , materials science , ion current , langmuir probe , sputter deposition , plasma , magnetic field , cavity magnetron , substrate (aquarium) , current (fluid) , magnet , current density , saturation (graph theory) , atomic physics , optoelectronics , sputtering , voltage , plasma diagnostics , chemistry , thin film , physics , electrical engineering , nanotechnology , thermodynamics , engineering , oceanography , mathematics , organic chemistry , quantum mechanics , combinatorics , geology
The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets’ positions was modelled with finite element methods. The ion saturation current in the substrate region showed more than twofold variation with unbalancing degree in the range 0.6–1.2. The dependence was non-monotonic, and the system was optimized to maximize the substrate ion current. The Langmuir probe diagnostics showed plasma density ~ 10 16 m −3 in the optimized magnetic configuration.