Open AccessDeposition of Al2O3 coatings in Ar-O2 low-pressure discharge plasma under a high dissociation degree of O2
Author(s) -
P. V. Tretnikov,
Н. М. Гаврилов,
A. S. Kamenetskikh,
С. В. Кривошапко,
А. В. Чукин
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2064/1/012047
Subject(s) - dissociation (chemistry) , cathode , plasma , analytical chemistry (journal) , anode , crystallite , materials science , atomic physics , electrode , chemistry , metallurgy , physics , chromatography , quantum mechanics
The deposition of Al 2 O 3 coating with a corundum structure was done by anodic evaporation in a low-pressure arc with a self-heated hollow cathode. The conditions were created for increasing the energy of plasma electrons and a corresponding increase in the frequency of O 2 dissociation by contraction of the discharge in the anode region. The discharge was maintained in a combined mode with a constant current (70 – 100 A), on which current pulses (100 μs, 1 kHz) with adjustable amplitude (up to 220 A) were superimposed. This mode ensured a change in the degree of O 2 dissociation in the range of 0.3 – 0.5 at constant average discharge current and Al evaporation rate. It is shown that an increase in the degree of O 2 dissociation leads to an increase in the rate of coating deposition by a factor of 1.3 and promotion of the preferred (300) orientation of crystallites. The effect is due to the features of the adsorption of molecular and atomic oxygen on the Al 2 O 3 .