Open AccessCharge and elemental composition of plasma generated by sputtering of powder target from amorphous boron
Author(s) -
Yu. F. Ivanov,
В. В. Шугуров,
О. В. Крысина,
V. E. Prokopiev
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2064/1/012042
Subject(s) - boron , materials science , sputtering , analytical chemistry (journal) , amorphous solid , plasma , chemistry , thin film , nanotechnology , crystallography , physics , organic chemistry , chromatography , quantum mechanics
One of the effective and widespread methods of surface hardening of metal products is an ion-plasma saturation of the surface of machine parts and mechanisms with various elements (nitrogen, oxygen, carbon). Less investigated method is the process of ion-plasma saturation of the metals and alloys surface with boron. The purpose of the present work is to develop a method for the formation and study of parameters (electron temperature, plasma potential and concentration), elemental and charge composition of plasma generated at sputtering of a target from amorphous boron powder. To achieve the stated goal, a discharge system with a hot anode made of powder boron, as well as a pulse arc evaporator with a hot cathode made of sintered boron powder, was developed, designed, created and tested. Charge and elemental composition of boron-containing plasma generated during powder target sputtering from amorphous boron are defined by optical spectrometry method. It is shown that the generated plasma contains mainly neutral atoms and single-charge boron ions, as well as iron, silicon, copper and argon particles.