Open AccessObtaining thin metal films and their compounds using magnetron sputtering and arc evaporation in a single technological cycle
Author(s) -
Dmitry Shashin,
Н. И. Сушенцов
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2059/1/012022
Subject(s) - evaporation , sputter deposition , materials science , sputtering , arc (geometry) , thin film , cavity magnetron , metal , deposition (geology) , metallurgy , high power impulse magnetron sputtering , analytical chemistry (journal) , optoelectronics , engineering physics , nanotechnology , chemistry , engineering , mechanical engineering , physics , thermodynamics , geology , environmental chemistry , paleontology , sediment
The authors of the article consider the possibility of obtaining thin films using magnetron sputtering and arc evaporation. The prospects of combining these methods in a single processing unit for obtaining films with high performance characteristics have been shown.