Open AccessThin film coatings material particles creation by pulsed methods in vacuum
Author(s) -
Yu. V. Panfilov,
L. Kolesnik,
A V Gurov
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2059/1/012017
Subject(s) - materials science , high power impulse magnetron sputtering , thin film , nanocrystalline material , optoelectronics , microsecond , coating , pulsed laser deposition , deposition (geology) , electric arc , pulsed power , sputtering , sputter deposition , engineering physics , nanotechnology , optics , electrode , electrical engineering , voltage , paleontology , chemistry , physics , sediment , biology , engineering
Thin film materials particles creation pulsed methods such as magnetron sputtering HiPIMS, pulsed laser deposition PLD, vacuum arc pulsed discharge, high-intensity pulsed ion beam impact HIPIB, as well, were described. It was shown that the stream of material, created by means of an explosion action such as ablation, avalanche paired impacts and microsecond electrical disruption as well creates preconditions for nanocrystalline thin film coating manufacture.