Open AccessStudy of the parameters of molybdenum oxide films by optical methods
Author(s) -
D S Nikolyukin,
В. М. Шаповалов
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2059/1/012016
Subject(s) - materials science , molybdenum , band gap , reflection (computer programming) , sputtering , oxide , absorption (acoustics) , sputter deposition , optics , spectral line , flux (metallurgy) , range (aeronautics) , thin film , optoelectronics , composite material , metallurgy , nanotechnology , physics , astronomy , computer science , programming language
In this work, the physical properties of molybdenum oxide films obtained by reactive magnetron sputtering were studied. Based on the experimental transmission and reflection spectra for samples at different currents in the fundamental absorption region, the optical band gap was determined, and in the visible range, the thickness of the films was defined. The studied films had the values of optical parameters that were observed by other authors. However, the dependence of the optical band gap width on the thickness of the films is not found in the literature and can be associated with the influence of the flux density of the substance sputtered from the target surface on the structure of the film.