Open AccessStructure and properties of the low-energy deposited TiO2 thin films: results of the molecular dynamics simulation
Author(s) -
F. V. Grigoriev,
V. B. Sulimov,
Alexander V. Tikhonravov
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2015/1/012051
Subject(s) - titanium dioxide , thin film , silicon dioxide , deposition (geology) , refractive index , anisotropy , materials science , molecular dynamics , silicon , titanium , tensor (intrinsic definition) , dynamics (music) , chemical physics , optics , nanotechnology , chemistry , composite material , computational chemistry , optoelectronics , physics , geometry , metallurgy , mathematics , paleontology , sediment , acoustics , biology
The classical molecular dynamics simulation of the low-energy glancing angle deposition of titanium dioxide films is performed. The deposition angle varies from 60° to 80°. It is found that the film structure consists of parallel slanted columns which lead to the anisotropy of films properties. The difference between the main components of the refractive index tensor is about 0.14, which is close to the values obtained for high-energy titanium dioxide films and larger than 0.03 obtained earlier for silicon dioxide films.