Open AccessMechanical scanning probe lithography of nanophotonic devices based on multilayer TMDCs
Author(s) -
Bogdan R. Borodin,
Fedor A. Benimetskiy,
V. Yu. Davydov,
Ilya A. Eliseyev,
Sergey Lepeshov,
Andrey Bogdanov,
P. A. Alekseev
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2015/1/012020
Subject(s) - nanophotonics , materials science , lithography , resonator , optoelectronics , nanosphere lithography , substrate (aquarium) , nanolithography , photolithography , nanotechnology , optics , fabrication , physics , medicine , oceanography , alternative medicine , pathology , geology
In this work, we demonstrate the possibility of using mechanical Scanning probe lithography (m-SPL) for fabricating nanophotonic devices based on multilayered transition metal dichalcogenides (TMDCs). By m-SPM, we created a nanophotonic resonator from a 70-nm thick MoSe 2 flake transferred on Si/Au substrate. The optical properties of the created structure were investigated by measuring microphotoluminescence. The resonator exhibits four resonance PL peaks shifted in the long-wavelength area from the flake PL peak. Thus, here we demonstrate that m-SPL is a high-precision lithography method suitable for creating nanophotonic devices based on multilayered TMDCs.