Open AccessInfluence of nitrogen ratios on rutile to anatase phase transition of titanium oxynitride thin films deposited via reactive magnetron sputtering
Author(s) -
Phalakorn Khwansungnoen,
Attapol Choeysuppaket,
Tanattha Rattana
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/2013/1/012006
Subject(s) - anatase , materials science , crystallite , thin film , rutile , scanning electron microscope , analytical chemistry (journal) , sputter deposition , sputtering , crystallization , titanium , annealing (glass) , cavity magnetron , mineralogy , chemical engineering , composite material , metallurgy , nanotechnology , chemistry , photocatalysis , biochemistry , chromatography , engineering , catalysis
Thin films of titanium oxynitride deposited via reactive direct current (DC) magnetron sputtering method followed by annealing treatment at 500 °C for crystallization improvement. The thin films were grown under the Ar/O 2 /N 2 gases mixture by various nitrogen ratios. The crystalline structure, surface morphology, and optical properties of the obtained thin films were investigated by X-ray diffraction (XRD), scanning electron microscope (SEM), and ultraviolet-visible spectrophotometer, respectively. The rutile to anatase phase transition could be detected that increased with increasing the nitrogen ratio and also affected the crystallite size and the thickness of the thin films. The optical bandgap evaluated by the Tauc plot is in the range of 2.78–3.17 eV.