
Focused ion beam microfabrication of single-crystal nanobridge toward Fe(Te, Se)-based Josephson device
Author(s) -
Takamaro Miyazawa,
Naoki Tadokoro,
Shumpei Horikawa,
T. Tamegai,
Yue Sun,
Haruhisa Kitano
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1975/1/012010
Subject(s) - josephson effect , focused ion beam , materials science , ion , single crystal , microfabrication , crystal (programming language) , condensed matter physics , fabrication , ion beam , beam (structure) , optoelectronics , superconductivity , crystallography , chemistry , physics , optics , medicine , alternative medicine , organic chemistry , pathology , computer science , programming language
We report the fabrication and the transport measurements of FeTe 1-x Se x ( x =0.4, 1) nanobridges along the c axis, toward the appearance of Josephson effects in single-crystal devices. Cross sectional areas of both FeTe 0.6 Se 0.4 and FeSe nanobridges were systematically reduced to 0.06 μm 2 by using a new method based on the focused ion beam (FIB) techniques. The critical current I c measured by the current-voltage characteristics is roughly two orders of magnitude smaller than that for the conventional microbridges with larger cross sections, while the I c R n product, where R n is the normal-state resistance along the c axis, is still 3-4 times larger than the theoretical value for the appearance of Josephson effects. We argue the importance of the development of single-crystal Josephson devices and the comparison between FeTe 0.6 Se 0.4 and FeSe nanobridges.