Open AccessLithography alignment method based on image rotation matching
Author(s) -
Shaoyu Zhang,
Lei Zhao,
Yu He
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1939/1/012039
Subject(s) - lithography , computer vision , artificial intelligence , aerial image , image processing , computer science , rotation (mathematics) , digital image processing , image (mathematics) , enhanced data rates for gsm evolution , template matching , feature detection (computer vision) , optics , physics
In this paper, we propose a lithography alignment method based on digital image processing technology for the proximity-contact lithography system. We perform image processing such as edge detection and image segmentation on the input image to obtain the edge image of the alignment mark; then we use straight line detection to obtain the angle of the image and rotate the image; finally, we use the template of the alignment mark to perform image matching to obtain the position of the alignment mark. The algorithm is tested on a proximity-contact lithography machine. The results have proved that the algorithm can use any shape of pattern for lithography alignment and therefore is highly adaptable and has a wide range of applications.