
Simulation of chemical composition nitrogen-argon-aluminum plasma
Author(s) -
В. И. Струнин,
Zh G Khudaibergenov
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1901/1/012107
Subject(s) - plasma , dissociation (chemistry) , ion , nitrogen , argon , aluminium , nitride , analytical chemistry (journal) , materials science , chemistry , metallurgy , environmental chemistry , nanotechnology , physics , organic chemistry , layer (electronics) , quantum mechanics
Plasma-chemical model of magnetron discharge is described. The model allows you to predict the densities of the main plasma components. As a result of numerical modeling, it was found that dissociation of N 2 ranges from 10% to 30% with an increase in plasma power, the degree of dissociation increases. The addition of N 2 to the plasma leads to a decrease in ion density due to energy consumption for non-ionizing molecular collisions. It can be assumed that aluminum nitride is deposited on the surface of a substrate with a high flow of metal ions in combination with a stream of neutral molecules N2 with a low adhesion coefficient and a relatively small flow of nitrogen ions.