Open AccessSynthesis of silicon spherical nanostructures in argon plasma
Author(s) -
Б. А. Тимеркаев,
V S Feltsinger,
R K Gevorgian,
R P Shaikhattorov,
A. A. Kaleeva
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1870/1/012004
Subject(s) - silicon , argon , materials science , plasma , nanostructure , monocrystalline silicon , plasma cleaning , crystalline silicon , nanotechnology , optoelectronics , atomic physics , physics , quantum mechanics
The paper presents the results of the synthesis of silicon nanospheres (silicon fullerenes) in argon plasma. During the experiment, silicon atoms were evaporated from the surface of a single crystal using a plasma jet. Silicon atoms were entrained by the flow of argon plasma and, as the plasma cooled, formed in the form of spherical structures several atomic layers thick or in the form of silicon nanotubes. The diameters of silicon nanospheres range from 50 nm to 15 microns, and silicon nanotubes - from 40 to 100 nm.