Open AccessElectrical contact resistance of tungsten coatings deposited on Cu and Al conductors
Author(s) -
Georgi Kotlarski,
Stefan Valkov,
А. В. Андреева,
Valentin Mateev,
Iliana Marinova,
Petеr Petrov
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1859/1/012063
Subject(s) - materials science , contact resistance , electrical contacts , electrical conductor , tungsten , electrical resistance and conductance , surface roughness , hysteresis , composite material , electrical resistivity and conductivity , surface finish , evaporation , diffraction , metallurgy , optics , electrical engineering , condensed matter physics , physics , engineering , layer (electronics) , thermodynamics
In this work we study the effects of W coatings on the electrical contact resistance of Cu and Al conductors. The coatings were deposited by means of electron beam evaporation in a vacuum environment. The structure of the obtained samples was analysed using X-ray diffraction (XRD) and the surface roughness was studied by atomic force microscopy (AFM). The electrical contact resistance hysteresis of the W coatings and the base Al and Cu conductors is measured and analysed. The results obtained in this study are discussed concerning the possible applications of the coatings in the field of electrical engineering.