Open AccessRF magnetron sputtering of Bi12TiO20 thin films on various substrates
Author(s) -
Ivaylo Balchev,
T. Nurgaliev,
I. Kostadinov,
L. Lakov,
Mihaela Aleksandrova,
Georgi Avdeev,
E. Valcheva,
Stoyan C. Russev,
Kaloyan V. Genkov,
T. I. Milenov
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1859/1/012060
Subject(s) - materials science , scanning electron microscope , raman spectroscopy , sputter deposition , thin film , analytical chemistry (journal) , amorphous solid , energy dispersive x ray spectroscopy , sputtering , spectroscopy , optics , crystallography , composite material , nanotechnology , chemistry , physics , chromatography , quantum mechanics
Using RF magnetron sputtering, we deposited Bi1 2 TiO 20 (BTO) thin films on various substrates (glass, quartz, stainless steel (SS304), (001) and (111) Si and sital-ceramics, Al and Cu foils). The films had a constant thickness of 1.3 μm. The as-deposited films were studied by Raman spectroscopy, scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX), as well as by grazing incidence X-ray diffractometry (GIXRD). The GIXRD results reveal that the films are amorphous, while the Bi/Ti ratio varies between 9.5/1 and 11.8/1, as shown by the energy dispersive X-ray analysis (EDX). Further, the films deposited on glass and SS304 substrates were modified by laser irradiation (CuBr laser with a wavelength λ = 511 nm) to obtain an ordered cubic phase. The films deposited on quartz and on (001) and (111) Si substrates were thermally annealed at about 510 oC for three hours in ambient atmosphere. The modified films were characterized by Raman spectroscopy, scanning electron microscopy (SEM), EDX and X-ray diffractometry.