
Improving the quality of nanofilms produced by magnetron sputtering
Author(s) -
V. A. Tupik,
A. A. Potapov,
V. I. Margolin,
D. K. Kostrin
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1799/1/012037
Subject(s) - sputter deposition , materials science , quality (philosophy) , nanoscopic scale , sputtering , cavity magnetron , engineering physics , nanotechnology , process engineering , thin film , engineering , physics , quantum mechanics
Technological and structural aspects of the synthesis of nanoscale films by magnetron sputtering methods and ways for improving their uniformity and structural perfection are considered. Experimental results demonstrate that the proposed technological solution makes it possible to obtain high-quality coatings with almost complete absence of the droplet component.