Open AccessMagnetron with sandwich target for solid composite film deposition Mo x Cr1–x N
Author(s) -
A A Kozin,
В. М. Шаповалов,
Д. С. Шестаков,
A. V. Rudakov,
A E Shabalin,
В. А. Павлов
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1799/1/012018
Subject(s) - stoichiometry , composite number , materials science , cavity magnetron , sputter deposition , deposition (geology) , range (aeronautics) , nitrogen , analytical chemistry (journal) , composite material , sputtering , thin film , nanotechnology , chemistry , paleontology , chromatography , sediment , biology , organic chemistry
In this paper, we consider a technological magnetron equipped with a sandwich target designed for the synthesis of Mo x Cr 1– x N composite films with a continuous change in the stoichiometric coefficient x , which provides a smooth change in hardness. In this paper, the relationship between the stoichiometric coefficient x and the geometric factor equal to the relative total area of the slots in the external target is established. It is established that the proposed magnetron with a sandwich target makes it possible to synthesize Mo x Cr 1– x N solid composite films with a continuous change in the stoichiometric coefficient x, which provides a smooth change in the hardness from 18 to 33 GPA. In this case, the stoichiometric coefficient can be controlled in the range 0 < x < 0.3, varying the area of the slots in the range 0 < α < 0.5 for the specified values of the discharge current density and nitrogen consumption.