
Simulation of sputtering a sandwich target in a reactive gas medium
Author(s) -
V V Smirnov
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1713/1/012044
Subject(s) - sputtering , isothermal process , arrhenius equation , evaporation , thermodynamics , thermionic emission , nitrogen , materials science , kinetics , chemistry , physics , classical mechanics , thin film , nanotechnology , quantum mechanics , electron , organic chemistry
A model of reactive sputtering of a sandwich target in nitrogen is considered. The target temperature is determined as a function of the ion current density. For the mathematical description of the process, the basic postulate of chemical kinetics is used, taking into account the Langmuir isotherm equation and the Arrhenius equation under non-isothermal conditions. In addition, thermionic emission and evaporation of the target surface are taken into account in the model.