Open AccessDevelopment of front contact grid for GaP/Si solar cells
Author(s) -
М. В. Богданова,
И. А. Морозов,
A. S. Gudovskih
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1695/1/012081
Subject(s) - materials science , photovoltaic system , grid , optoelectronics , contact resistance , engineering physics , electrical contacts , sheet resistance , annealing (glass) , scalability , equivalent series resistance , silicon , nanotechnology , mechanical engineering , electrical engineering , computer science , engineering , metallurgy , geology , geodesy , layer (electronics) , database , voltage
A scalable technology for applying metallization to GaP/Si photovoltaic structures for mass production was explored. The study of Ag-based contacts, which are obtained by screen-printing of silver past followed by subsequent annealing, are presented in this paper. Contact resistance measurements are done using the TLM method. The developed contacts have demonstrated excellent performance even in comparison with the vacuum deposition technology, which is the basis for using the developed technology of forming contacts in industry.