Open AccessEffect of the Al content in the substrate on the In nanodroplets growth by droplet epitaxy
Author(s) -
N. E. Chernenko,
С. В. Балакирев,
M. M. Eremenko,
М. С. Солодовник
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1695/1/012012
Subject(s) - epitaxy , substrate (aquarium) , materials science , content (measure theory) , wavelength , layer (electronics) , chemical physics , nanotechnology , optoelectronics , chemistry , geology , mathematics , mathematical analysis , oceanography
The paper presents the results of an experimental study of the effect of Al content in the epitaxial surface layer on the growth of In nanostructures formed by droplet epitaxy. We have shown that an increase in the Al content leads to a decrease in the droplet density and an increase in their size. We also showed that the influence of the Al content on the droplet characteristics is much less significant than that in case of the Stranski-Krastanov growth. The increase in the critical thickness of droplet formation on Al-containing surfaces when the temperature decreases is not significant. It allows us to control quantum dot emission wavelength almost independently of their geometric characteristics.