Open AccessAu Nanoparticle Sub-Monolayers Buried between Magnetron Oxide Thin Layers
Author(s) -
Anastasia Kondrateva,
Yakov Enns,
Ivan Komarevtsev,
D. A. Kudryashov,
М. В. Мишин
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1695/1/012002
Subject(s) - materials science , non blocking i/o , sputter deposition , heterojunction , oxide , nanoparticle , thin film , band gap , nickel oxide , nanostructure , annealing (glass) , optoelectronics , nanotechnology , chemical engineering , sputtering , composite material , metallurgy , chemistry , biochemistry , engineering , catalysis
In this work, a versatile method to increase the optical response of the oxide nanostructures is proposed. It combines a magnetron deposition of oxide matrix with the thermal deposition and aggregation of metallic nanoparticles, allowing the preparation of wide band gap oxide heterostructures with buried plasmonic Au nanoparticles. Thin layers of Si/TiO 2 and Si/NiO were deposited by reactive magnetron sputtering in a 2D nanostructure, followed by 2.5 nm gold layer thermal deposition and in N 2 thermal annealing at 550 °C to induce the growth of the Au nanoparticles. Then Si/TiO 2 /AuNP and Si/NiO/AuNP were covered with TiO 2 and NiO respectively. The reflectance maximum of the LSPR band appeared at around 700 ÷ 720 nm for both heterostructures. It was demonstrated that both Si/TiO 2 /AuNP/TiO 2 and Si/NiO/AuNP/NiO heterostructures can enhance optical response in comparison with Si/TiO 2 and Si/NiO. The results obtained indicate a broad prospect of using the formed structures in the field of integrated optoelectronic devices.