Open AccessUsing OES to measurement of electron temperature of SF6/Ar gas mixture of ICP discharges
Author(s) -
А. А. Осипов,
А. А. Осипов,
Vladimir I. Berezenko,
Sergei Alexandrov
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1679/2/022006
Subject(s) - electron temperature , plasma , inductively coupled plasma atomic emission spectroscopy , inductively coupled plasma , analytical chemistry (journal) , electron , atomic physics , plasma parameters , materials science , chemistry , physics , nuclear physics , chromatography
Optical emission spectroscopy was used to study the properties of the inductively coupled plasma of SF 6 /Ar gas mixture. In particular, the effect of RF power supplied to the discharge on the temperature of electrons in the plasma was studied. It was found that the electron temperature gradually decreases with an increase in the RF power. An increase in the RF power from 500 to 750 W leads to a decrease in the electron temperature (T e ) of the plasma by about 1.5 times. A qualitative substantiation of the discovered pattern is given.