Open AccessInvestigation of fine metal films of the Ni-Al system by physical methods
Author(s) -
А. В. Ишков,
V. N. Malikov
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1658/1/012021
Subject(s) - materials science , deposition (geology) , scanning electron microscope , resistive touchscreen , vacuum deposition , evaporation , microscope , vacuum evaporation , thin film , optics , metal , optical microscope , analytical chemistry (journal) , nanotechnology , composite material , metallurgy , chemistry , electrical engineering , paleontology , physics , chromatography , sediment , biology , thermodynamics , engineering
The article describes the results of investigations of ultrathin Ni-Al films, obtained by the resistive method of thermal evaporation and having characteristic islands sizes of 700-1000 nm with a film thickness of about 500 nm. The work presents a method for producing a film using an installation for creating a high vacuum and subsequent film deposition. Investigations of the obtained film sample were carried out with the help of an optic microscope, a scanning probe microscope and a Fourier analyzer. Kinetic characteristics and relief of the film, characteristic islands sizes are established, the search for regularities in the island structure of films is carried out, and its electrical conductivity is determined.