
On refractive index of optical radiation of polycrystalline silicon films
Author(s) -
В. В. Гаврушко,
А. С. Ионов,
В А Ласткин,
I S Telina
Publication year - 2020
Publication title -
journal of physics conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1658/1/012016
Subject(s) - refractive index , materials science , crystallite , silicon , polycrystalline silicon , wavelength , sapphire , optics , step index profile , refractive index profile , optoelectronics , laser , composite material , graded index fiber , physics , fiber optic sensor , layer (electronics) , fiber , metallurgy , thin film transistor
Transmission spectra of layers of polycrystalline silicon on sapphire with a thickness of 0.1 … 0.8 µm were investigated. The refractive indices were determined in the range of 0.5 … 2.7 μm. An increase in the refractive index with decreasing wavelength was established. An increase in the film thickness from 0.1 to 0.8 μm led to a decrease in the refractive index from 3.2 to 2.8 at λ = 1.5 μm. Compared to single crystals, the refractive indices of polycrystalline films were lower. The data obtained can be used to build models for calculating the optical characteristics of complex compositions.
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