Open AccessPhotoreflectance study of β-FeSi2epitaxial films grown by molecular beam epitaxy
Author(s) -
Yoshikazu Terai,
Katsuhisa Noda,
Syoutaro Hashimoto,
Yoshihiro Fujiwara
Publication year - 2009
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/165/1/012023
Subject(s) - brillouin zone , epitaxy , molecular beam epitaxy , acceptor , materials science , crystallite , conduction band , valence (chemistry) , condensed matter physics , band gap , beam energy , crystallography , chemistry , optoelectronics , optics , beam (structure) , nanotechnology , physics , metallurgy , organic chemistry , layer (electronics) , quantum mechanics , electron