Open AccessThe atomic model of the Sn plasmas for the EUV source
Author(s) -
Akira Sasaki,
A. Sunahara,
Katsunobu Nishihara,
Takeshi Nishikawa,
Fumihiro Koike,
H. Tanuma
Publication year - 2009
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/163/1/012107
Subject(s) - extreme ultraviolet lithography , plasma , source model , materials science , atomic physics , physics , nanotechnology , computational physics , nuclear physics