A novel Cu2O/Cu grid for photoelectrochemical water spliting | Zendy

Xing Wang | Zendy; Jun Chen | Zendy; Xiaoling Wu | Zendy; Guoan Cheng | Zendy; Ruiting Zheng | Zendy

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A novel Cu₂O/Cu grid for photoelectrochemical water spliting

Author(s) -

Xing Wang,

Jun Chen,

Xiaoling Wu,

Guoan Cheng,

Ruiting Zheng

Publication year - 2020

Publication title -

journal of physics conference series

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.21

H-Index - 85

eISSN - 1742-6596

pISSN - 1742-6588

DOI - 10.1088/1742-6596/1520/1/012013

Subject(s) - photocurrent , deposition (geology) , materials science , electrochemistry , electrode , current density , copper , metal , water splitting , semiconductor , grid , analytical chemistry (journal) , metallurgy , optoelectronics , chemistry , catalysis , photocatalysis , geology , paleontology , biochemistry , physics , quantum mechanics , chromatography , sediment , geodesy

In this study, we reported a novel metal-semiconductor junction grid, which is made of Cu and Cu 2 O. The Cu 2 O film is deposited on the surface of a Cu grids by a simple electrochemical deposition method. Cu grids with 200 mesh has larger specific surface area than that of Cu sheet and will enhance the water splitting performance of photo-electrodes. Different Cu-Cu 2 O grid samples were prepared by changing the electrodeposition time and current. The best deposition parameters for Cu 2 O films on Cu grids were 3 hours of deposition time and 0.4 mA/cm 2 of deposition current density. Under the best condition, the highest photocurrent density was −3.83 mA/cm 2 which was higher than −2.36mA/cm 2 of Cu 2 O films on Cu sheet.

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