Open AccessReactively sputtered Ti-Si-N films for application as heating layers for low-current phase-change memory
Author(s) -
You Yin,
Tomoyuki Noguchi,
Kazuhiro Ota,
Naoya Higano,
Hayato Sone,
Sumio Hosaka
Publication year - 2009
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/152/1/012026
Subject(s) - materials science , current (fluid) , phase change memory , phase change , phase (matter) , optoelectronics , sputtering , thin film , metallurgy , engineering physics , composite material , nanotechnology , electrical engineering , layer (electronics) , chemistry , physics , engineering , organic chemistry