Open AccessThe use of plasmon resonance spectroscopy to analyze the parameters of thin layers
Author(s) -
V. V. Yatsyshen
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1515/2/022047
Subject(s) - ellipsometry , polarization (electrochemistry) , plasmon , optics , surface plasmon , materials science , surface plasmon resonance , reflection coefficient , excitation , spectroscopy , circular polarization , total internal reflection , reflection (computer programming) , ellipse , ray , resonance (particle physics) , thin film , optoelectronics , atomic physics , chemistry , physics , nanotechnology , computer science , programming language , microstrip , quantum mechanics , astronomy , nanoparticle
The paper presents the results of calculating the angular spectra of ellipsometric parameters and ellipse parameters upon reflection of right-polarized light onto the Kretchman layered system under conditions of excitation of surface plasmons at the boundary of the silver metal layer. It is shown that the studied parameters turn out to be very sensitive when a film of the material under study is placed in a layered system. The conditions are found under which a change in the nature of the polarization of the reflected wave occurs - from the right circular wave of the incident wave to the left elliptical in reflected light. Thus, the use of circular polarization and ellipsometry in plasmon resonance spectroscopy expands the possibilities of this method, in which only the energy reflection coefficient of p-polarized light is studied.