Open AccessMeasurement and control of the substrate temperature in vertical graphene nanosheets deposition
Author(s) -
V. Vachkov,
Zh Kiss’ovski
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1492/1/012061
Subject(s) - thermocouple , temperature control , materials science , substrate (aquarium) , deposition (geology) , graphene , optoelectronics , temperature measurement , thermoelectric effect , microcontroller , atmospheric temperature range , pid controller , thermometer , microwave , analytical chemistry (journal) , nanotechnology , electrical engineering , composite material , computer science , chemistry , thermodynamics , physics , paleontology , telecommunications , oceanography , engineering , chromatography , sediment , biology , geology
The characteristics of the microwave surface-wave plasma discharge at atmospheric pressure and the control of the gas mixture (Ar/H 2 /CH 4 ) in the deposition chamber, together with the temperature of the metallic substrate, are important parameters in the processes of deposition of vertical graphene nanosheets. Since obtaining carbon nanostructures necessitates regulating the substrate temperature in the range 550 – 980 °C, we developed an electronic system based on an Arduino Uno microcontroller. It was designed to automatically measure and control the temperature of the substrate heater with the capability of varying smoothly the temperature by a PID-regulator. The measurements were carried out by a K-type thermocouple, whose hot end was placed at the point of measuring the temperature. The resulting thermoelectric voltage was amplified by a MAX 31855 amplifier, followed by processing by the microcontroller and subsequent determination of the temperature. This system offers the possibility of controlling accurately the temperature as required by the regime of deposition.