Open AccessOptimization of ALD grown Ni-, Co- and Fe-doped ZnO films
Author(s) -
B. Blagoev,
Penka Terziyska,
V. Mehandzhiev,
P. Tzvetkov,
Daniela Kovacheva,
I. Avramova,
T. Ivanova,
K.A. Gesheva,
A. Paskaleva
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1492/1/012053
Subject(s) - x ray photoelectron spectroscopy , doping , materials science , atomic layer deposition , substrate (aquarium) , fourier transform infrared spectroscopy , ellipsometry , layer (electronics) , chemical engineering , deposition (geology) , transition metal , analytical chemistry (journal) , metal , thin film , nanotechnology , metallurgy , chemistry , optoelectronics , catalysis , paleontology , oceanography , biochemistry , chromatography , sediment , geology , engineering , biology
Ni-, Co- and Fe-doped ZnO films were grown by atomic layer deposition on Si and glass substrates. The structures prepared were studied and characterized by XRD, XPS, ellipsometry and FTIR. The crystalline ZnO structure showed a strong dependence on the substrate used and the type of transition metal ion despite of the low doping levels.