Open AccessComposition, structure and adhesion of cathodic-arc and glow-discharge deposited TiN/TiO2 coatings: a case study
Author(s) -
Maria P. Nikolova,
Stefan Valkov,
Emil Yankov,
Petеr Petrov
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1492/1/012037
Subject(s) - tin , x ray photoelectron spectroscopy , materials science , titanium nitride , anatase , titanium , tin oxide , nitride , cathodic arc deposition , rutile , glow discharge , physical vapor deposition , coating , surface modification , chemical engineering , metallurgy , oxide , composite material , cathodic protection , layer (electronics) , chemistry , plasma , photocatalysis , electrode , anode , engineering , biochemistry , quantum mechanics , catalysis , physics
Titanium-based vacuum coatings, such as TiN and TiO 2 , are being widely used for functionalization of the surfaces and for forming protective surface layers for a number of applications. In this study, TiN/TiO 2 coatings were deposited by two physical vacuum deposition (PVD) methods: cathodic-arc (for TiN) and glow-discharge (for TiO 2 ) deposition. We studied the bilayer film composition, structure and properties by means of X-ray diffraction (XRD) analysis, X-ray photoelectron spectroscopy (XPS), and scratch test analysis. The XRD spectrum indicated the presence of both anatase and rutile TiO 2 phases, together with TiN reflections. The Ti 2p, O 1s and N 1s core level of XPS spectra in the depth of the oxide up to the oxide-nitride interface indicated intimate heterojunction between the layers. This results in a lower coefficient of friction and improved adhesion strength of the TiN/TiO 2 film compared with pristine TiN coating.